Semiconductor Grade MPCVD Equipments
Our company is a leading domestic supplier of MPCVD equipment, offering the industry's most extensive range of microwave plasma chemical vapor deposition systems. These systems have been delivered to numerous research institutions, which utilize our systems for scientific research across various fields, from semiconductor manufacturing to communications, defense, electronic measurements, and more.
We not only provide customers with advanced CVD diamond reaction systems but also offer comprehensive customer support, system integration, and after-sales service. We have many technical advantages include acceptance testing and installation, maintenance and repairs, process and application support, and other technical consultations. Common products are listed in the table below:
| Product features | |
|---|---|
| All-metal chamber with water-cooled | |
| Simple and intuitive user graphical interface | |
| Stable high-power, high-density plasma | |
| On-site monitoring and diagnostics with multiple acquisition ports | |
| Computer-controlled automatic mode and manual personalized control mode | |
| Application | |
|---|---|
| Electronic-grade single crystal diamond substrate | |
| Epitaxy on electronic-grade single crystal diamond substrate | |
| Optical-grade polycrystalline diamond substrate | |
| High-quality lab-grown diamond | |
| Cutting tools | |
01. DH6A—MPCVD
| Standard Configuration and Parameters | |
|---|---|
| Power Input : | Three-phase 380V (±10%), 15KVA |
| Microwave Power Supply : | 6KW（2.45GHz） |
| Sample Stage : | 8-inch water-cooled copper stage |
| Chamber Pressure : | 10-200Torr |
| Gas Lines : | Standard 4 lines （H2、O2、CH4、N2） |
| Reaction Chamber : |
Horizontal clamshell butterfly metal water-cooled chamber (4 observation windows) |
| Main Cabinet Dimensions : |
900mm(W)×850mm(D)×1680mm(H) （Approximately 320Kg） |
| Control Cabinet Dimensions : |
570mm(W)×850mm(D)×1800mm(H) （Approximately 240Kg） |
02. DH5S—MPCVD
| Standard Configuration and Parameters | |
|---|---|
| Power Input : | Three-phase 380V (±10%), 15KVA |
| Microwave Power Supply : | 6KW（2.45GHz） |
| Sample Stage : | 2-inch adjustable water-cooled stage |
| Chamber Pressure: | 10-200Torr |
| Gas Lines : | Standard 4 lines （H2、O2、CH4、N2） |
| Reaction Chamber : |
Stainless steel cylindrical double-layer water-cooled chamber ( 5 observation windows) |
| Main Cabinet Dimensions : |
1500mm(W)×700mm(D)×2100mm(H) （Approximately 380Kg） |
| Control Cabinet Dimensions : |
570mm(W)×850mm(D)×1800mm(H) （Approximately 240Kg） |
03. DH10A—MPCVD
| Standard Configuration and Parameters | |
|---|---|
| Power Input : | Three-phase 380V (±10%), 15KVA |
| Microwave Power Supply : | 10KW（2.45GHz） |
| Sample Stage : | 8-inch water-cooled copper stage |
| Chamber Pressure: | 10-200Torr |
| Gas Lines : | Standard 4 lines （H2、O2、CH4、N2） |
| Reaction Chamber : |
Horizontal clamshell butterfly metal water-cooled chamber （4 observation windows） |
| Main Cabinet Dimensions : |
900mm(W)×850mm(D)×1680mm(H) （Approximately 320Kg） |
| Control Cabinet Dimensions : |
570mm(W)×850mm(D)×1800mm(H) （Approximately 240Kg） |
04. DH15A-MPCVD
| Standard Configuration and Parameters | |
|---|---|
| Power Input : | Three-phase 380V (±10%), 15KVA |
| Microwave Power Supply : | 15KW（2.45GHz） |
| Sample Stage : | 8-inch water-cooled copper stage |
| Chamber Pressure : | 10-200Torr |
| Gas Lines : | Standard 4 lines（H2、O2、CH4、N2） |
| Reaction Chamber : |
Horizontal clamshell butterfly metal water-cooled chamber （4 observation windows） |
| Main Cabinet Dimensions : |
900mm(W)×850mm(D)×1680mm(H) （Approximately 320Kg） |
| Control Cabinet Dimensions : |
570mm(W)×850mm(D)×1800mm(H) （Approximately 240Kg） |
05. DH75A—MPCVD
| Standard Configuration and Parameters | |
|---|---|
| Power Input : | Three-phase 380V (±10%), 15KVA |
| Microwave Power Supply : | 75KW (915 MHZ) |
| Sample Stage : | 23-inch water-cooled copper stage |
| Chamber Pressure : | 10-200Torr |
| Gas Lines : | Standard 4 lines（H2、O2、CH4、N2） |
| Reaction Chamber : |
Horizontal clamshell butterfly metal water-cooled chamber （6 observation windows） |
If you have special requirements for diamond semiconductor-grade MPCVD equipment, please contact us. We will customize suitable MPCVD equipment according to your inquiries. The standard optional configurations are shown in the table below:
| Standard Configuration and Parameters | |
|---|---|
| 1 : | Reaction gas lines (up to 6 lines according to user requirements) |
| 2: | Dry pump |
| 3 : | Dual-wavelength infrared thermometer (475-1475°C) |
| 4: | Disappearing filament optical pyrometer (800-2850°C) |
| 5 : | Optical emission spectrometer for plasma analysis |
| 6 : | Automatic/manual operation platform for equipment |
Contact Us
Please contact us anytime to learn about our
technology and products