Technology

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Technology

Diamontech produces high-quality diamond products on a large scale, achieving inch-scale diamond substrates through unique stitching and heteroepitaxy technologies. Our highly automated production process provides premium substrates and devices for diamond semiconductor users worldwide.
  • Mosaic Growth Single Crystal Diamond Technology

    Mosaic growth technology is an effective method for obtaining large single-crystal diamonds. The basic principle involves using MPCVD equipment to combine together multiple small single-crystal diamond seed crystals to grow a complete large single-crystal diamond. This process mainly includes three key steps: single-crystal diamond clone growth, combining growth, and thick film growth. Clone growth technology is used to produce 10mm x 10mm single-crystal diamond seeds from the same master template. Then, a unique combining growth technology is employed to obtain large single-crystal diamond substrates. Finally, techniques such as thick film growth, cutting, grinding, and polishing are used to achieve mass production of the substrates. The specific process steps are as follows:

  • Heteroepitaxy Technology

    Heteroepitaxy is another effective method for obtaining large single-crystal diamonds. The basic principle involves using MPCVD equipment to epitaxially grow large single-crystal diamond substrates on heterogeneous substrates. First, a buffer layer of metal Ir film is deposited on a specific heterogeneous substrate. Second, diamond (001) oriented bias nucleation is performed on the Ir film surface. Finally, an appropriate diamond growth process is used to grow large (001) single-crystal diamonds.

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